| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition exhibiting good performance in terms of pattern collapse and a pattern profile not only in normal exposure (dry exposure) but also in liquid immersion exposure, and which ensures good pattern resolution and a good pattern profile in double exposure, and a pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition comprises: (A) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (B) a resin of which solubility in an alkali developer increases under the action of an acid; and (C) a compound capable of decomposing under the action of an acid to generate an acid. The pattern forming method using the positive resist composition is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
