摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition which is suitable for forming a fine pattern of ≤100 nm, is improved in line edge roughness, and is suitable for immersion lithography because it can form a photosensitive film having a high refractive index, and to provide a pattern forming method using the positive photosensitive composition. <P>SOLUTION: The positive photosensitive composition comprises (A) a heterocyclic compound containing a plurality of sulfur atoms in the cyclic structure, (B) a resin which is decomposed by the action of an acid to increase solubility in an alkali developer, and (C) a compound capable of generating an acid upon irradiation with an actinic ray or radiation. <P>COPYRIGHT: (C)2008,JPO&INPIT |