发明名称 Method for manufacturing substrate for making microarray
摘要 To provide a method for manufacturing a substrate for making a microarray which will ensure the secure immobilization of a material in a site-selective manner at a low cost. The method comprises the steps of: forming a monomolecular film on the surface of a substrate using a silane compound represented by the following general formula (1), <?in-line-formulae description="In-line Formulae" end="lead"?>Y<SUB>3</SUB>Si-(CH<SUB>2</SUB>)<SUB>m</SUB>-X (1)<?in-line-formulae description="In-line Formulae" end="tail"?> ,wherein m represents an integer from 3 to 20; X represents a hydroxyl group precursor functional group which will be converted to a hydroxyl group when exposed to acid; and Y independently represents a halogen atom or alkoxy group having 1-4 carbon atoms; and converting the hydroxyl group precursor functional group represented by X to a hydroxyl group; wherein the step of converting a hydroxyl group precursor functional group represented by X to a hydroxyl group comprises forming, on the monomolecular film, a polymer layer containing a compound represented by the following general formula (2) or (3),
申请公布号 US2008233309(A1) 申请公布日期 2008.09.25
申请号 US20080073953 申请日期 2008.03.12
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 KUSAKI WATARU;KINSHO TAKESHI;ISHIHARA TOSHINOBU
分类号 C23C14/28 主分类号 C23C14/28
代理机构 代理人
主权项
地址