发明名称 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus and method which can prevent an atmosphere in a cup from externally leaking from the inside of the cup. SOLUTION: In the substrate processing apparatus, a lower end of an air flow control drum 6 is arranged in between an upper space US above a spin base 13 and an internal space S1 defined so as to surround the periphery of the spin base 13 in the interior of a cup 2, so that an air flow flowing from the upper space US toward the internal space S1 can be controlled. When a substrate S is dried while being rotated, by moving up or down the air flow control drum 6 while the value of a pressure (internal pressure value) in the inner space S1 and the value of a pressure (external pressure value) in an external space S2 of the cup 2, a spacing between the air flow control drum 6 and the spin base 13 is adjusted so that a difference obtained by subtracting the internal pressure value from the external pressure value becomes zero or positive. Thus an atmosphere within the cup 2 can be prevented from externally leaking from the cup 2. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009059795(A) 申请公布日期 2009.03.19
申请号 JP20070224264 申请日期 2007.08.30
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 JODAI KAZUO;MATSUI HISAAKI
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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