发明名称 DEVICE AND METHOD FOR STANDARDIZING MYOBLAST DIFFERENTIATION INTO MYOTUBES
摘要 The invention relates to a device for standardizing myoblast differentiation into myotubes, comprising a substrate (1) and at least one cell-adhesive pattern (2) for culturing myoblasts on said substrate, wherein: said pattern (2) has an elongated surface comprising a central region (2C) and two lateral regions (2L) extending from said central region in both directions along a longitudinal axis of the pattern with a contour discontinuity between the central region (2C) and each lateral region (2L),the ratio between the maximum width (WC) of the central region (2C) and the maximum width (WL) of the lateral regions (2L) is greater than or equal to 2,the ratio between the length (L) and the maximum width (WC) of the pattern (2) is less than or equal to 4.;The invention is also a method for standardizing myoblast differentiation into myotubes, comprising: (i) providing a device as described above,(ii) depositing myoblasts on at least one cell-adhesive pattern of said device,(iii) culturing said myoblasts in a differentiation medium during a determined incubation time so as to promote cell differentiation into myotubes and constrain elongation of the myotubes on the cell-adhesive pattern.;Another aspect of the invention is a method for compounds screening in cell-based assays related to myotoxicity and drug discovery.
申请公布号 US2016312187(A1) 申请公布日期 2016.10.27
申请号 US201415105548 申请日期 2014.12.17
申请人 Cytoo 发明人 FERNANDES Mathieu;DEGOT Sebastien;MARGARON Yoran;LIU Jie;BORNENS Michel;CALVO MUNOZ Maria Luisa;BERTHELOT Aurelie;FUCHS Alexandra;YOUNG Joanne;MORALES Delphine
分类号 C12N5/077;C12M3/00;G01N15/14;C12M1/00;C12M1/34;C12M1/12;G01N33/50 主分类号 C12N5/077
代理机构 代理人
主权项 1. A device for controlling myoblast differentiation into myotubes with standardized morphological parameters, comprising a substrate and at least one cell-adhesive pattern for culturing myoblasts on said substrate, wherein: said pattern has an elongated surface comprising a central region and two lateral regions extending from said central region in both directions along a longitudinal axis of the pattern with a contour discontinuity between the central region and each lateral region, a length of the pattern being comprised between 100 and 1000 μm and a maximum width of said pattern being comprised between 50 and 500 μm, a ratio between a maximum width of the central region and a maximum width of the lateral regions is greater than or equal to 2, a ratio between the length and the maximum width of the pattern is less than or equal to 4.
地址 Grenoble FR