Illumination system for microlithography projection exposure apparatus, has Fourier optical unit provided in pupil shaping unit so that ratio between structural length and focal length of Fourier optical unit is set to preset value

摘要

The illumination system (190) has a beam expander (104) that expands cross-sectional area and divergence of a laser beam received from a laser source (102). A pupil shaping unit (150) forms a two-dimensional illumination intensity distribution in a pupil shaping surface (110) based on receiving laser beam from beam expander. A Fourier optical system is provided in the pupil shaping unit such that the ratio between structural length measured between entrance and exit sides and focal length of the Fourier optical system is set to specified value. Independent claims are included for the following: (1) light mixing system; and (2) microlithography projection exposure apparatus.