发明名称 ELECTRODEPOSITION BATHS, ELECTRODEPOSITION SYSTEMS AND ELECTRODEPOSITION METHODS
摘要 PROBLEM TO BE SOLVED: To provide new additives and/or new additive blends that are effective in electrodeposition processes that use complex waveforms such as pulse plating, alternating current plating, or reverse-pulse plating.SOLUTION: An electrodeposition bath comprises: at least one of tungsten and molybdenum ionic species; ionic species of a second metal such as nickel; and a brightening agent comprising an alkynyl alkoxy alkane compound. The electrodeposition bath further comprises: a hydroxy alkyne compound or betaine compound as a secondary brightening agent; and a sulfopropylated polyalkoxy naphthol compound or anionic, nonionic or amphoteric fluorocarbon compound as a wetting agent.
申请公布号 JP2015165053(A) 申请公布日期 2015.09.17
申请号 JP20150098516 申请日期 2015.05.13
申请人 XTALIC CORP 发明人 GLENN SKLAR;JOHN CAHALEN;NAZILA DADVAND;ALAN C LUND
分类号 C25D3/56;C25D5/18;C25D21/12 主分类号 C25D3/56
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