发明名称 |
ELECTRODEPOSITION BATHS, ELECTRODEPOSITION SYSTEMS AND ELECTRODEPOSITION METHODS |
摘要 |
PROBLEM TO BE SOLVED: To provide new additives and/or new additive blends that are effective in electrodeposition processes that use complex waveforms such as pulse plating, alternating current plating, or reverse-pulse plating.SOLUTION: An electrodeposition bath comprises: at least one of tungsten and molybdenum ionic species; ionic species of a second metal such as nickel; and a brightening agent comprising an alkynyl alkoxy alkane compound. The electrodeposition bath further comprises: a hydroxy alkyne compound or betaine compound as a secondary brightening agent; and a sulfopropylated polyalkoxy naphthol compound or anionic, nonionic or amphoteric fluorocarbon compound as a wetting agent. |
申请公布号 |
JP2015165053(A) |
申请公布日期 |
2015.09.17 |
申请号 |
JP20150098516 |
申请日期 |
2015.05.13 |
申请人 |
XTALIC CORP |
发明人 |
GLENN SKLAR;JOHN CAHALEN;NAZILA DADVAND;ALAN C LUND |
分类号 |
C25D3/56;C25D5/18;C25D21/12 |
主分类号 |
C25D3/56 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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