发明名称 SILICON NANO-TIP THIN FILM FOR FLASH MEMORY CELLS
摘要 A quantum nano-tip (QNT) thin film, such as a silicon nano-tip (SiNT) thin film, for flash memory cells is provided to increase erase speed. The QNT thin film includes a first dielectric layer and a second dielectric layer arranged over the first dielectric layer. Further, the QNT thin film includes QNTs arranged over the first dielectric layer and extending into the second dielectric layer. A ratio of height to width of the QNTs is greater than 50 percent. A QNT based flash memory cell and a method for manufacture a SiNT based flash memory cell are also provided.
申请公布号 US2016204212(A1) 申请公布日期 2016.07.14
申请号 US201514596487 申请日期 2015.01.14
申请人 Taiwan Semiconductor Manufacturing Co., Ltd. 发明人 Su Tsu-Hui;Chen Chih-Ming;Tsai Chia-Shiung;Yu Chung-Yi;Wang Szu-Yu
分类号 H01L29/423;H01L29/66;H01L29/792 主分类号 H01L29/423
代理机构 代理人
主权项 1. A flash memory cell comprising: a semiconductor substrate; and a quantum nano-tip thin film configured to trap charges corresponding to a unit of data, wherein the quantum nano-tip thin film includes: a first dielectric layer arranged over the semiconductor substrate;a second dielectric layer arranged over the first dielectric layer; andquantum nano-tips arranged over the first dielectric layer and extending into the second dielectric layer, wherein the quantum nano-tips culminate at points within the second dielectric layer and have a cone shape.
地址 Hsin-Chu TW