发明名称 |
SILICON NANO-TIP THIN FILM FOR FLASH MEMORY CELLS |
摘要 |
A quantum nano-tip (QNT) thin film, such as a silicon nano-tip (SiNT) thin film, for flash memory cells is provided to increase erase speed. The QNT thin film includes a first dielectric layer and a second dielectric layer arranged over the first dielectric layer. Further, the QNT thin film includes QNTs arranged over the first dielectric layer and extending into the second dielectric layer. A ratio of height to width of the QNTs is greater than 50 percent. A QNT based flash memory cell and a method for manufacture a SiNT based flash memory cell are also provided. |
申请公布号 |
US2016204212(A1) |
申请公布日期 |
2016.07.14 |
申请号 |
US201514596487 |
申请日期 |
2015.01.14 |
申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
Su Tsu-Hui;Chen Chih-Ming;Tsai Chia-Shiung;Yu Chung-Yi;Wang Szu-Yu |
分类号 |
H01L29/423;H01L29/66;H01L29/792 |
主分类号 |
H01L29/423 |
代理机构 |
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代理人 |
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主权项 |
1. A flash memory cell comprising:
a semiconductor substrate; and a quantum nano-tip thin film configured to trap charges corresponding to a unit of data, wherein the quantum nano-tip thin film includes:
a first dielectric layer arranged over the semiconductor substrate;a second dielectric layer arranged over the first dielectric layer; andquantum nano-tips arranged over the first dielectric layer and extending into the second dielectric layer, wherein the quantum nano-tips culminate at points within the second dielectric layer and have a cone shape. |
地址 |
Hsin-Chu TW |