| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate-processing apparatus and a method of processing a substrate, capable of reducing the height of a bulging part generated in the process of cleaning to remove the coating liquid coated around the peripheral edge of the substrate. SOLUTION: This substrate processing apparatus is provided with a rotary coating device 2 that coats the surface of a substrate 5 with a coating liquid in a form of a thin film, a preparatory drying device 3 that dries the coating liquid coated on the surface of the substrate 5 by the rotary coating device 2, and a peripheral-edge cleaning apparatus 4 that cleans to remove the coating liquid coated around the peripheral edge of the substrate 5 by feeding a cleaning liquid composed of ester species or a cleaning liquid containing ester species around the peripheral edge of the substrate 5, after the coating liquid coated on the surface is dried by the preparatory drying device 3. |
