发明名称 Electrostatic Particle Exposure System and Method of Exposing a Target Material to Small Particles
摘要 A system for exposing a target material to small particles. The system includes an exposure chamber that receives the target material. A stream of charged particles is directed via an inlet into the exposure chamber toward the target material. One or more electrodes are located relative to the target material and the inlet, and are electrically charged, so as to cause at least some of the charged particles to impact upon the target material. The system can be used to expose the target material to small, for example, nanoscale, particles in a gas environment.
申请公布号 US2008047825(A1) 申请公布日期 2008.02.28
申请号 US20070844008 申请日期 2007.08.23
申请人 THE UNIVERSITY OF VERMONT AND STATE AGRICULTURAL COLLEGE 发明人 PETRUCCI GIUSEPPE A.
分类号 B01J19/00 主分类号 B01J19/00
代理机构 代理人
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