发明名称 COMPOSITION FOR COPPER FILM FORMATION AND METHOD OF MANUFACTURING COPPER FILM USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a composition for copper film formation in a solution state not including a solid phase of fine particles etc., such that a copper film which has sufficient electric conductivity and is high in adhesion to a base body can be obtained with low energy by applying the composition for copper film formation over the base body and processing it by a flash lamp method using a xenon lamp.SOLUTION: There is provided a composition for copper film formation that contains at least one kind of diol compound selected from the group of copper formate or its hydrate, a compound represented by general formula (1) and a compound represented by general formula (1'), a specific dye compound, and an organic solvent dissolving components thereof, and contains the diol compound within a range of 0.1 to 6.0 mol/kg when the total of the content of the copper formate or its hydrate and the content of copper acetate or its hydrate is 1 mol/kg.
申请公布号 JP2015172226(A) 申请公布日期 2015.10.01
申请号 JP20140048578 申请日期 2014.03.12
申请人 ADEKA CORP 发明人 ABE TETSUJI;SAITO KAZUYA
分类号 C23C18/14;H01B1/20;H01B13/00 主分类号 C23C18/14
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