| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing liquid supply system which allows for pressure feed conveniently and inexpensively, without dissolving a gas into process liquid, in a system for pressure-feeding process liquid in a semiconductor cleaning process, and to provide a substrate processing device using the same.SOLUTION: Vapor of the same substance as the process liquid produced by a vaporization unit 33 is supplied to a process liquid pooled in process liquid storage tanks 32a, 32b. The vapor produced by a vaporization unit 33 is subjected to pressure adjustment, and supplied through a vapor supply pipe 37 to the process liquid storage tanks 32a, 32b, thus pressure-feeding the process liquid to a discharge section. A substrate processing device includes a process liquid supply section 6 internally.SELECTED DRAWING: Figure 3 |
