| 摘要 |
PROBLEM TO BE SOLVED: To provide a plasma generation device capable of forming plasma in a space with few impurities while using a small amount of gas.SOLUTION: A substrate 6 is mounted on a first electrode 2 with conductivity. A second electrode 3 faces the substrate 6 with a space therebetween on a side opposite to the first electrode 2 with respect to the substrate 6. When a high frequency voltage is applied between the first electrode 2 and the second electrode, a high frequency electric field is generated therebetween. A dielectric 4 is disposed between the first electrode 2 and the second electrode 3, and has a recessed shape that opens to a first electrode 2 side. A gas passage part 5 is connected to a plasma space between the dielectric 4 and the first electrode 2, and flows gas for plasma generation.SELECTED DRAWING: Figure 1 |
