发明名称 WAFER PRODUCING METHOD
摘要 A wafer producing method for producing a hexagonal single crystal wafer from a hexagonal single crystal ingot including a separation start point forming step of setting the focal point of a laser beam inside the ingot at a predetermined depth from the ingot's upper surface, which depth corresponds to the thickness of the wafer to be produced, and next applying the laser beam to the upper surface of the ingot while relatively moving the focal point and the ingot to thereby form: (i) a modified layer parallel to the ingot's upper surface, and (ii) cracks extending from the modified layer, thus forming a separation start point. Preferably, the laser beam includes a plurality of laser beams to be simultaneously applied to form a plurality of linear modified layers. The focal points of the laser beams are arranged with predetermined spacing in the direction of formation of an off angle.
申请公布号 US2016354863(A1) 申请公布日期 2016.12.08
申请号 US201615165686 申请日期 2016.05.26
申请人 DISCO CORPORATION 发明人 Hirata Kazuya
分类号 B23K26/00;B23K26/06;H01L29/20;B23K26/53;H01L29/04;H01L29/16 主分类号 B23K26/00
代理机构 代理人
主权项 1. A wafer producing method for producing a hexagonal single crystal wafer from a hexagonal single crystal ingot having a first surface, a second surface opposite to said first surface, a c-axis extending from said first surface to said second surface, and a c-plane perpendicular to said c-axis, said wafer producing method comprising: a separation start point forming step of setting the focal point of a laser beam having a transmission wavelength to said ingot inside said ingot at a predetermined depth from said first surface, which depth corresponds to the thickness of said wafer to be produced, and next applying said laser beam to said first surface as relatively moving said focal point and said ingot to thereby form a modified layer parallel to said first surface and cracks extending from said modified layer along said c-plane, thus forming a separation start point; and a wafer separating step of separating plate-shaped member having a thickness corresponding to the thickness of said wafer from said ingot at said separation start point after performing said separation start point forming step, thus producing said wafer from said ingot; said separation start point forming step including a modified layer forming step of relatively moving the focal point of said laser beam in a first direction perpendicular to a second direction where said c-axis is inclined by an off angle with respect to a normal to said first surface and said off angle is formed between said first surface and said c-plane, thereby linearly forming said modified layer extending in said first direction, andan indexing step of relatively moving said focal point in said second direction to thereby index said focal point by a predetermined amount, wherein in said modified layer forming step, said laser beam includes a plurality of laser beams to be simultaneously applied to form a plurality of linear modified layers, the focal points of said laser beams being arranged in said second direction with a predetermined spacing.
地址 Tokyo JP