| 摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering system capable of easily depositing an optical multilayer film having optical properties extremely close to the design properties of the designed optical multilayer film, to provide a sputtering method therefor, and to provide an optical multilayer film produced by the sputtering method. SOLUTION: In the sputtering method in an oxidation mode for depositing an optical multilayer film on a substrate face within a vacuum tank, the total pressure in the vacuum tank is controlled in the process of depositing the optical multilayer film, thus at least either the sputtering voltage or sputtering current is held to prescribed value or prescribed width. COPYRIGHT: (C)2005,JPO&NCIPI
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