| 摘要 |
The invention pertains to a process for the production of particle beam systems ( 10 - 10'''', 12 - 12'' ), in which at least one first particle beam system ( 10 - 10 '''') is produced on a first substrate ( 14 ) by computer-guided particle beam-induced deposition, and the minimum of one first particle beam system ( 10 - 10 '''') is used to produce at least one second particle beam system ( 12 - 12 '') on at least one second substrate ( 16 ) by computer-guided particle beam-induced deposition. The inventive process makes it possible to produce a large number of particle beam systems in a relatively short time.
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