发明名称 |
Exposure method and apparatus for immersion lithography |
摘要 |
A method for immersion lithography includes providing a substrate coated with an imaging layer, dispensing a conductive immersion fluid between the substrate and an imaging lens of a lithography system, and performing an exposure process to the imaging layer using a radiation energy through the conductive immersion fluid.
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申请公布号 |
US2007085034(A1) |
申请公布日期 |
2007.04.19 |
申请号 |
US20050251330 |
申请日期 |
2005.10.14 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
CHANG CHING-YU;LIN CHIN-HSIANG;LIN BURN J.;LU DAVID |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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