发明名称 STRESS RELEASE MECHANISM IN MEMS DEVICE AND METHOD OF MAKING SAME
摘要 MEMS devices (100) and methods for forming the devices have now been provided. In one exemplary embodiment, the MEMS device (100) comprises a substrate (106) having a surface, an electrode (128) having a first portion coupled to the substrate surface, and a second portion movably suspended above the substrate surface, and a stress-release mechanism (204) disposed on the electrode second portion, the stress-release mechanism (204) including a first slot (208) integrally formed in the electrode. In another exemplary embodiment, the substrate (106) includes an anchor (134, 136) and the stress-release mechanism 222 is formed adjacent the anchor (134, 136).
申请公布号 KR20080033299(A) 申请公布日期 2008.04.16
申请号 KR20087002072 申请日期 2006.06.28
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 LI GARY G.;HAMMOND JONATHAN HALE;KOURY JR. DANIEL N.
分类号 G01P15/125;B81B7/00;H02N1/00 主分类号 G01P15/125
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