| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate development method, a developing apparatus, and a substrate-treating device capable of removing a development liquid soaked into a resist film in the development liquid supplied to a substrate from the substrate. SOLUTION: A cleaning liquid is supplied to the substrate after the development liquid (steps S1, S2), and then the substrate is rotated for shaking the cleaning liquid off the substrate for drying (step S3). As the cleaning liquid on the substrate is evaporated, the development liquid soaked into the resist film can be moved onto the surface. Then, the cleaning liquid that has been moved by rotation treatment can be washed away by cleaning treatment after movement (step S4). In this manner, the development liquid soaked into the resist film can be removed from the substrate, thus suppressing the remainder of the development liquid where the development liquid remains on the substrate after the development and hence preventing development defects from occurring. COPYRIGHT: (C)2008,JPO&INPIT |
