发明名称 Plasma processing apparatus
摘要 A vertical plasma processing apparatus for performing a plasma process on a plurality of target objects together at a time includes an activation mechanism configured to turn a process gas into plasma. The activation mechanism includes a vertically elongated plasma generation box attached to a process container at a position corresponding to a process field to form a plasma generation area airtightly communicating with the process field, an ICP electrode provided to the plasma generation box, and an RF power supply connected to the electrode.
申请公布号 US2009056877(A1) 申请公布日期 2009.03.05
申请号 US20080230468 申请日期 2008.08.29
申请人 TOKYO ELECTRON LIMITED 发明人 MATSUURA HIROYUKI;TAKAHASHI TOSHIKI;FUKUSHIMA KOHEI
分类号 C23F1/08;C23C16/54 主分类号 C23F1/08
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