发明名称 TECHNIQUES FOR PLASMA INJECTION
摘要 Techniques for plasma injection for space charge neutralization of an ion beam are disclosed. In one particular exemplary embodiment, the techniques may be realized as a plasma injection system for space charge neutralization of an ion beam. The plasma injection system may comprise a first array of magnets and a second array of magnets positioned along at least a portion of an ion beam path, the first array being on a first side of the ion beam path and the second array being on a second side of the ion beam path, the first side opposing the second side. At least two adjacent magnets in the first array of magnets may have opposite polarity. The plasma injection system may also comprise a plasma source configured to generate a plasma in a region associated with a portion of the ion beam path by colliding at least some electrons with a gas.
申请公布号 US2009026390(A1) 申请公布日期 2009.01.29
申请号 US20070781700 申请日期 2007.07.23
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC. 发明人 BENVENISTE VICTOR M.;ANGEL GORDON;KOO BON-WOONG;SAADATMAND KOUROSH
分类号 H01J37/08 主分类号 H01J37/08
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