发明名称 MANUFACTURING METHOD FOR HIGH-PURITY ZIRCONIUM OR HAFNIUM POWDER
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing high-purity zirconium or halfnium powder at a low cost and with safety, capable of reducing impurities thereof, which are obstacles to assurance of operational functions of a semi-conductor. SOLUTION: The method for manufacturing the high-purity zirconium or halfnium powder includes the steps of: applying electron beam to zirconium or halfnium raw material for melting it to a high-purity level and casting the resultant molten metal into an ingot; heating an ingot or chips of the resultant high-purity zirconium or hafnium to≥500°C in a hydrogen atmosphere to be hydrogenated; cooling the ingot and peeling the zirconium or halfnium hydride powder from the ingot to obtain high-purity zirconium hydride or halfnium hydride powder; and removing hydrogen from the high-purity zirconium hydride or halfnium hydride powder. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009057634(A) 申请公布日期 2009.03.19
申请号 JP20080240746 申请日期 2008.09.19
申请人 NIKKO KINZOKU KK 发明人 SHINDO YUICHIRO
分类号 B22F9/04;C22B9/04;C22B34/14;C22C16/00;C22C27/00 主分类号 B22F9/04
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