| 摘要 |
There is provided a novel material for forming an underlayer film for lithography, which has a high carbon concentration, a low oxygen concentration, a relatively high heat resistance and also a relatively high solvent solubility, and which can be applied to a wet process. The material for forming an underlayer film for lithography of the present invention contains a compound represented by the following general formula (1).
(in formula (1), each X independently represents an oxygen atom or a sulfur atom, each R 1 independently represents a single bond or a 2n-valent hydrocarbon group having 1 to 30 carbon atoms, the hydrocarbon group may have a cyclic hydrocarbon group, a double bond, a hetero atom, or an aromatic group having 6 to 30 carbon atoms, and each R 2 independently represents a linear, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, or a hydroxyl group, provided that at least one R 2 represents a hydroxyl group, each m is independently an integer of 1 to 6, and n is an integer of 1 to 4.) |
