发明名称 High Voltage ESD Protection Apparatus
摘要 A device comprises a high voltage n well and a high voltage p well over a buried layer, a first low voltage n well over the high voltage n well, wherein a bottom portion of the first low voltage n well is surrounded by the high voltage n well, an N+ region over the first low voltage n well, a second low voltage n well and a low voltage p well over the high voltage p well, a first P+ region over the second low voltage n well and a second P+ region over the low voltage p well.
申请公布号 US2016276334(A1) 申请公布日期 2016.09.22
申请号 US201615165832 申请日期 2016.05.26
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Chang Yi-Feng;Lee Jam-Wem
分类号 H01L27/02;H01L23/50;H01L27/06;H01L29/06;H01L29/08;H01L29/10 主分类号 H01L27/02
代理机构 代理人
主权项 1. An apparatus comprising: an NPN transistor having a collector formed by a N+ region, a first low voltage n well and a high voltage n well;a base formed by a first P+ region, a low voltage p well with a first doping density and a high voltage p well with a second doping density; andan emitter formed by a second low voltage n well; and a diode formed by a P+ region and the second low voltage n well, wherein: the P+ region extends from a first isolation region to a second isolation region;the P+ region is formed on the second low voltage n well; anda top surface of the P+ region is level with a top surface of the N+ region.
地址 Hsin-Chu TW