发明名称 |
High Voltage ESD Protection Apparatus |
摘要 |
A device comprises a high voltage n well and a high voltage p well over a buried layer, a first low voltage n well over the high voltage n well, wherein a bottom portion of the first low voltage n well is surrounded by the high voltage n well, an N+ region over the first low voltage n well, a second low voltage n well and a low voltage p well over the high voltage p well, a first P+ region over the second low voltage n well and a second P+ region over the low voltage p well. |
申请公布号 |
US2016276334(A1) |
申请公布日期 |
2016.09.22 |
申请号 |
US201615165832 |
申请日期 |
2016.05.26 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Chang Yi-Feng;Lee Jam-Wem |
分类号 |
H01L27/02;H01L23/50;H01L27/06;H01L29/06;H01L29/08;H01L29/10 |
主分类号 |
H01L27/02 |
代理机构 |
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代理人 |
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主权项 |
1. An apparatus comprising:
an NPN transistor having
a collector formed by a N+ region, a first low voltage n well and a high voltage n well;a base formed by a first P+ region, a low voltage p well with a first doping density and a high voltage p well with a second doping density; andan emitter formed by a second low voltage n well; and a diode formed by a P+ region and the second low voltage n well, wherein:
the P+ region extends from a first isolation region to a second isolation region;the P+ region is formed on the second low voltage n well; anda top surface of the P+ region is level with a top surface of the N+ region. |
地址 |
Hsin-Chu TW |