| 摘要 |
A method of depositing tantalum to form a tantalum coating on substrates is provided. The method comprises preparing a tantalum-containing mixture having a tantalum donor, a halide activator, and a tantalum halide activator; preparing a substrate for deposition of the tantalum from the tantalum-containing mixture; and heating the substrate and the tantalum-containing mixture to a given temperature to deposit the tantalum on the substrate. |
