发明名称 感活性光線性又は感放射線性樹脂組成物、該組成物を用いたレジスト膜、パターン形成方法、及び電子デバイスの製造方法
摘要 There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by Formula (1): wherein R1 represents a polycyclic aromatic group or a polycyclic heterocyclic aromatic group, R2 represents a (n+2)-valent saturated hydrocarbon group. R3 represents a (m+2)-valent saturated hydrocarbon group, R4 and R5 each independently represent a substituent, Q represents a linking group containing a heteroatom, m and n each independently represent an integer of 0 to 12, when n is 2 or more, R4's may be the same or different, R4's may be linked to each other to form a non-aromatic ring together with R2, when m is 2 or more, R5's may be the same or different, and R5's may be linked to each other to form a non-aromatic ring together with R3, and X− represents a non-nucleophilic anion.
申请公布号 JP5997982(B2) 申请公布日期 2016.09.28
申请号 JP20120191849 申请日期 2012.08.31
申请人 富士フイルム株式会社 发明人 後藤 研由;渋谷 明規;片岡 祥平;山口 修平;松田 知樹;加藤 啓太
分类号 G03F7/004;G03F7/039 主分类号 G03F7/004
代理机构 代理人
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