发明名称 DEVICE FOR GENERATING HAZE ON PHOTO MASK
摘要 An apparatus for generating haze on a photomask is provided to effectively analyze a correlation between generation of haze and the condition in a process chamber by intentionally controling the humidity, temperature and a gas composition ratio in the process chamber. An optical system processes a laser beam emitted form a laser emitting part in a manner that the laser beam has a predetermined shape and energy distribution. A window made of a light transmitting material that a laser beam transmits is installed in the upper part of a process chamber in which a space for disposing a photomask is installed wherein the space is isolated from the outside. While the laser beam transmitting the optical system transmits the window to be irradiated to the photomask disposed in the space, a monitoring part monitors whether haze is generated on the photomask. A moisture supply part supplies moisture to the space in the process chamber. A gas supply part supplies mixture gas to the space in the process chamber wherein at least one kind of gas is mixed in the mixture gas. A heating part increases the temperature of the space of the process chamber. An environment control part(60) respectively controls the moisture supply part, the gas supply part and the heating part in a manner that reference environment including reference humidity, reference temperature and a reference gas composition ratio is formed in the space based upon the humidity, the temperature and the gas composition ratio of the space.
申请公布号 KR100822677(B1) 申请公布日期 2008.04.17
申请号 KR20060129250 申请日期 2006.12.18
申请人 KORNIC SYSTEMS CORP. 发明人 KIM, DAE JIN;GO, GUN SUP;KIM, HYUN JUNG;EOM, SEUNG HWAN;LEE, KWANG JAE
分类号 H01L21/027 主分类号 H01L21/027
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