METHODOLOGY FOR PATTERN DENSITY OPTIMIZATION

摘要

The present disclosure relates to a method of improving pattern density with a low OPC (optical proximity correction) cycle time, and an associated apparatus. In some embodiments, the method is performed by performing an initial data preparation process on an IC design including a graphical representation of a layout used to fabricate an integrated chip. The initial data preparation process is performed by using a data preparation element to generate a modified IC design having modified shapes that are modified forms of shapes within the IC design. One or more low-pattern-density areas of the modified IC design are identified using a local density checking element. One or more dummy shapes are added within the one or more low-pattern-density areas using a dummy shape insertion element. The one or more dummy shapes are separated from the modified shapes by a non-zero space.

主权项

1. A method of data preparation, comprising:
performing an initial data preparation process on an IC design comprising a graphical representation of a layout used to fabricate an integrated chip, wherein the initial data preparation process is performed by using a data preparation element to generate a modified IC design having modified shapes that are modified forms of shapes within the IC design; identifying one or more low-pattern-density areas of the modified IC design using a local density checking element; and adding one or more dummy shapes within the one or more low-pattern-density areas using a dummy shape insertion element, wherein the one or more dummy shapes are separated from the modified shapes by a non-zero space.