发明名称 Optimized photodiode process for improved transfer gate leakage
摘要 An image sensing circuit and method is disclosed, wherein a photodiode is formed in a substrate through a series of angled implants. The photodiode is formed by a first, second and third implant, wherein at least one of the implants are angled so as to allow the resulting photodiode to extend out beneath an adjoining gate. Under an alternate embodiment, a fourth implant is added, under an increased implant angle, in the region of the second implant. The resulting photodiode structure substantially reduces or eliminates transfer gate subthreshold leakage.
申请公布号 US2005167708(A1) 申请公布日期 2005.08.04
申请号 US20050094363 申请日期 2005.03.31
申请人 RHODES HOWARD E.;MAURITZSON RICHARD A.;PATRICK INNA 发明人 RHODES HOWARD E.;MAURITZSON RICHARD A.;PATRICK INNA
分类号 H01L21/00;H01L27/146;H01L31/0352;H01L31/062;H01L31/103;(IPC1-7):H01L31/062 主分类号 H01L21/00
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