| 发明名称 |
NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS |
| 摘要 |
Photoacid generators generate sulfonic acids of formula (1a) or (1c) upon exposure to high-energy radiation. <?in-line-formulae description="In-line Formulae" end="lead"?>R1-COOCH(CF3)CF2SO3+H+ (1a)<?in-line-formulae description="In-line Formulae" end="tail"?> <?in-line-formulae description="In-line Formulae" end="lead"?>R1-O-COOCH(CF3)CF2SO3-H+ (1c)<?in-line-formulae description="In-line Formulae" end="tail"?> R1 is a C20-C50 hydrocarbon group having a steroid structure. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
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| 申请公布号 |
US2009061358(A1) |
申请公布日期 |
2009.03.05 |
| 申请号 |
US20080204685 |
申请日期 |
2008.09.04 |
| 申请人 |
OHASHI MASAKI;OHSAWA YOUICHI;WATANABE TAKERU;KINSHO TAKESHI |
发明人 |
OHASHI MASAKI;OHSAWA YOUICHI;WATANABE TAKERU;KINSHO TAKESHI |
| 分类号 |
G03F7/004;C07J5/00;C07J43/00;G03F7/20 |
主分类号 |
G03F7/004 |
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