发明名称 INTEGRATED CIRCUIT DEVICE AND METHOD FOR FORMING THE SAME
摘要 The invention provides an integrated circuit device. The integrated circuit device includes a semiconductor substrate. An isolation structure is positioned in the semiconductor substrate. A first electrode and a second electrode are positioned on the semiconductor substrate and coupled to different voltage supplies. The first electrode laterally or parallelly overlaps the second electrode. The first electrode and the second electrode vertically overlap the isolation structure. As a result, leakage current is mitigated or eliminated so that the reliability and performance of the integrated circuit device are improved.
申请公布号 US2016197071(A1) 申请公布日期 2016.07.07
申请号 US201514861461 申请日期 2015.09.22
申请人 MediaTek Inc. 发明人 YEH Chao-Yang;CHEN Yi-Feng;FANG Jia-Wei;HUANG Yao-Tsung;LEE Ming-Cheng
分类号 H01L27/08;H01L49/02;H01L21/283 主分类号 H01L27/08
代理机构 代理人
主权项 1. An integrated circuit device, comprising: a semiconductor substrate; an isolation structure in the semiconductor substrate; and a first electrode and a second electrode on the semiconductor substrate and coupled to different voltage supplies, wherein the first electrode laterally overlaps and the second electrode are parallel.
地址 Hsin-Chu TW