发明名称 |
Precursor mixtures for use in preparing layers on substrates |
摘要 |
Methods of forming a layer on a substrate using complexes of Formula I. The complexes and methods are particularly suitable for the preparation of semiconductor structures. The complexes are of the formula LyMYz (Formula 1) wherein: M is a metal; each L group is independently a neutral ligand containing one or more Lewis-base donor atoms; each Y group is independently an anionic ligand; y=a nonzero integer; and z=a nonzero integer corresponding to the valence state of the metal.
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申请公布号 |
US2001042505(A1) |
申请公布日期 |
2001.11.22 |
申请号 |
US20010908052 |
申请日期 |
2001.07.18 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
VAARTSTRA BRIAN A. |
分类号 |
C23C16/40;C30B25/02;H01L21/314;H01L21/316;(IPC1-7):C30B28/14;C30B23/00;C30B25/00;C30B28/12 |
主分类号 |
C23C16/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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