POLYMERIZABLE COMPOUND HAVING ADAMANTANE STRUCTURE, PROCESS FOR PRODUCTION OF THE SAME, AND RESIN COMPOSITION

摘要

Disclosed are: a polymerizable compound having a fluorinated substituent (Z) with the structure represented by the general formula (1), an adamantane structure and a polymerizable group (A); a process for producing the polymerizable compound; and a photoresist composition, a thermocurable resin composition or a photocurable resin composition comprising a polymer produced by using the polymerizable compound. In the filed of photolithography, by using the polymerizable compound having an adamantane structure and the resin composition, it becomes possible to reduce the permeability of a liquid immersion medium and improve the dry-etching resistance in a liquid immersion exposure method and to reduce the adhesion to a mold and improve the dry-etching resistance in a nanoimprint method. (1)