| 摘要 |
An inductor in a semiconductor device and a method of making the same are provided to raise the fidelity of inductor and improve the electrical characteristic of the semiconductor device. An inductor of a semiconductor device comprises a semiconductor substrate(102), metal wirings(118a,128,136,142,144), and an inductor wiring(154) and a space layer. The semiconductor substrate has the lower structure including a transistor(106). The metal wirings are successively laminated on the semiconductor substrate. The inductor wiring is arranged on the upper side of the semiconductor substrate. The space layer is positioned at an interval between the semiconductor substrate and the inductor wirings. The metal wirings are successively formed on the selected region of the semiconductor substrate. The inductor wirings are formed at the remaining region of the semiconductor substrate. |
