METHOD FOR DRESSING POLISHING PADS

摘要

A method dresses one polishing cloth or two polishing pads simultaneously, in which a polishing cloth has been applied to a polishing plate, with at least one dresser (4), which is equipped with at least one dressing element (8), this at least one dressing element (8) being in contact with the at least one polishing cloth (11, 12) to be dressed, wherein the at least one polishing plate (21, 22) is rotated with a relative rotational speed and the at least one dresser (4) is rotated with a relative rotational speed and at least two different combinations of directions of rotation of the two pairs of polishing plates (21, 22) and pin wheels (31, 32) are executed during the simultaneous dressing of two polishing pads (11, 12) or during the dressing of one polishing cloth (11) of the polishing plate (21) and of the at least one dresser (4).

主权项

1. A method for dressing one polishing cloth or simultaneously dressing two polishing pads, each including a polishing cloth applied to a polishing plate, using at least one dresser including a dressing element, the dressing element being in contact with the polishing cloth to be dressed, the method comprising:
rotating the at least one polishing plate with a first relative rotational speed; rotating the at least one dresser with a second relative rotational speed; and executing at least two different combinations of directions of rotation of (i) the polishing plates and pin wheels during a simultaneous dressing of the two polishing pads or, (ii) during the dressing of the one polishing cloth of the polishing plate, and the at least one dresser.