| 发明名称 |
POLISHING PAD AND METHOD FOR MAKING THE SAME |
| 摘要 |
The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other. |
| 申请公布号 |
US2016199961(A1) |
申请公布日期 |
2016.07.14 |
| 申请号 |
US201514872370 |
申请日期 |
2015.10.01 |
| 申请人 |
San Fang Chemical Industry Co., Ltd. |
发明人 |
FENG CHUNG-CHIH;YAO I-PENG;WU WEN-CHIEH;SONG HSIN-RU |
| 分类号 |
B24B37/20;B24D3/28;B24D18/00 |
主分类号 |
B24B37/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A polishing pad, comprising:
a polymeric elastomer; and a plurality of hollow structures, uniformly distributed in the polymeric elastomer, wherein the sizes of the hollow structures are substantially equal to each other. |
| 地址 |
Kaohsiung City TW |
