PRECURSOR COMPOSITION FOR POROUS MEMBRANE, PROCESS FOR PREPARATION OF THE PRECURSOR COMPOSITION, POROUS MEMBRANE, PROCESS FOR PRODUCTION OF THE POROUS MEMBRANE, AND SEMICONDUCTOR DEVICE

摘要

Disclosed is a precursor composition comprising: a compound selected from a compound represented by the formula: Si(OR¹)₄ and a compound represented by the formula: R_a(Si)(OR²)_4-a (in the formulae, R¹ represents a univalent organic group; R represents a hydrogen atom, a fluorine atom or a univalent organic group; R² represents a univalent organic group; and a represents an integer ranging from 1 to 3, provided that R, R¹ and R² are the same as or different from one another); a thermally degradable organic compound; an element having a catalytic activity; urea; and the like. A porous membrane produced from the precursor composition is irradiated with ultraviolet ray, and then subjected to gas-phase reaction with a hydrophobic compound. A porous membrane thus prepared can be used for the manufacture of a semiconductor device.