| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device capable of precisely projection-exposing a pattern on a mask on a substrate. <P>SOLUTION: The exposure device comprises: an illumination optical system 10 for irradiating illumination light to the mask 11; a projection optical system 12 for projecting the illumination light on the substrate; first holding bodies 21a, 21b for causing a predetermined first curved surface formed on the mask pattern surface; second holding bodies 22a, 22b each causing a predetermined second curved surface to be formed on the image formation surface of the substrate. The pattern on the mask is projection-exposed on the substrate while the first and the second curved surfaces are maintained. In addition, the second curved surface is formed to match the first curved surface. <P>COPYRIGHT: (C)2008,JPO&INPIT |
