发明名称 CLEANING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a cleaning apparatus easily cleaning and carrying a large mask substrate with a compact cleaning tub, not requiring a large work space, with preferable operability. SOLUTION: A portal substrate operation part of the cleaning apparatus has a substrate elevating part forming a portal form straddling the cleaning tub 60, lowering a large glass substrate 85 in the cleaning tub 60, and elevating the lowered large glass substrate 85 from the cleaning tub 60; and a substrate carrying part moving in relation to the cleaning tub 60, and moves on two guide rails 40-1, 2 set on both sides of the cleaning tub 60. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008207116(A) 申请公布日期 2008.09.11
申请号 JP20070047260 申请日期 2007.02.27
申请人 SHIMADA PHYS & CHEM IND CO LTD 发明人 HARASAKI TADAHARU;TOZAWA HIRONORI;TAKISHITA KAZUHIRO;INOUE KAZUYASU;FUJIOKA YUTAKA
分类号 B08B3/04;B08B13/00;B65G49/04;H01J9/38;H01J17/16;H01L21/304;H01L21/677 主分类号 B08B3/04
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