| 摘要 |
PROBLEM TO BE SOLVED: To provide an imaging element, a manufacturing device and a manufacturing method that can suppress white scratch.SOLUTION: A gettering area is provided in an area having no effect on a pixel characteristic. The area having no effect on the pixel characteristic is an area which is doped with ions at a high dose amount. The area doped with ions at a high dose amount is an area which is doped with ions when source and drain portions and a contact portion are formed. The high dose amount is equal to 1.0E14 or more. The dose amount for forming the gettering area is equal to 5.0E14 or more. The gettering area is nitrogen (N), fluorine (F), carbon (C), argon (Ar), oxygen (O), molecular ions containing these elements or cluster ions containing these elements. An aspect of this technique is applicable to an imaging element.SELECTED DRAWING: Figure 7 |
