| 摘要 |
PROBLEM TO BE SOLVED: To provide a vibration arm formation method capable of reducing deviation from a desired shape of a cross-sectional shape of a vibration arm, and a vibration element provided with the vibration arm formed by the vibration arm formation method.SOLUTION: A vibration arm formation method includes: a mask formation step of forming a second mask M2 having an opening onto the other surface while forming a first mask M1 corresponding to a planar view shape of a vibration arm 22 onto a top surface of a crystal substrate 20; and an etching step of wet etching the crystal substrate 20 via the first and second mask M1, M2. In the mask formation step, an end portion M21 of a +X-axis side of the second mask M2 is positioned closer to the +X-axis side than an end portion M11 of the +X-axis side of the first mask M1, and an end portion M22 of a -X-axis side of the second mask M2 is positioned closer to the -X-axis side than an end portion M12 of the -X-axis side of the first mask M1.SELECTED DRAWING: Figure 3 |
