发明名称 SUBSTRATE FOR EMBEDDING IMAGING DEVICE AND METHOD FOR MANUFACTURING SAME, AND IMAGING APPARATUS
摘要 A substrate for embedding an imaging device includes: a core layer; a first multilayered wiring layer that is formed onto the core layer, the core layer and the first multilayered wiring layer having a cavity penetrating therethrough; a second multilayered wiring layer that is formed onto the core layer on a side opposite to the first multilayered wiring layer and that includes a conductive pattern formed at a position facing the cavity; a resin portion that is arranged inside the cavity and includes a bottom surface supported by the second multilayered wiring layer, a side face supported by the core layer, and a curved surface formed on a side opposite to the bottom surface; and an imaging device adhered along the curved surface inside the cavity.
申请公布号 US2016163751(A1) 申请公布日期 2016.06.09
申请号 US201514960094 申请日期 2015.12.04
申请人 TAIYO YUDEN CO., LTD. 发明人 SUGIYAMA Yuichi;MIYAZAKI Masashi;HAMADA Yoshiki
分类号 H01L27/146;H01L31/0203 主分类号 H01L27/146
代理机构 代理人
主权项 1. A substrate for embedding an imaging device, comprising: a core layer; a first multilayered wiring layer that is formed onto the core layer, the core layer and the first multilayered wiring layer having a cavity penetrating therethrough; a second multilayered wiring layer that is formed onto the core layer on a side opposite to the first multilayered wiring layer and that includes a conductive pattern formed at a position facing the cavity; a resin portion that is arranged inside the cavity and includes a bottom surface supported by the second multilayered wiring layer, a side face supported by the core layer, and a curved surface formed on a side opposite to the bottom surface; and an imaging device adhered along the curved surface inside the cavity.
地址 Tokyo JP