| 发明名称 |
Cylindrical Base, Master and Master Manufacturing Method |
| 摘要 |
Provided are a cylindrical base, a master and a method for manufacturing a master enabling a uniform transfer of a fine pattern. A cylindrical base of a quartz glass having an internal strain in terms of birefringence of less than 70 nm/cm is used. A resist layer is deposited to an outer circumference surface of this cylindrical base, a latent image is formed on the resist layer, the latent image formed on the resist layer is developed and the pattern of the developed resist layer is used as a mask for etching to form a structure including concaves or convexes arranged in a plurality of rows on the outer circumference surface of the cylindrical base. |
| 申请公布号 |
US2016214282(A1) |
申请公布日期 |
2016.07.28 |
| 申请号 |
US201415026509 |
申请日期 |
2014.12.04 |
| 申请人 |
DEXERIALS CORPORATION |
发明人 |
MURAMOTO Yutaka;KIKUCHI Masanao;KAJIYA Shunichi;OTOWA Takaaki;TAKAHASHI Yasuhiro |
| 分类号 |
B29C33/42;B29C35/08;B29C59/04;B29C33/38;B29D11/00 |
主分类号 |
B29C33/42 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A cylindrical base comprising a quartz glass in a cylindrical shape, wherein the cylindrical base has an internal strain in terms of birefringence of less than 70 nm/cm and waviness on an external circumference surface thereof having a period of 10 mm or less in the circumferential direction has an amplitude of less than 100 nm. |
| 地址 |
Tokyo JP |
