| 摘要 |
PROBLEM TO BE SOLVED: To enhance uniformity of etching by using electro static charge of a substrate.SOLUTION: The substrate processing apparatus includes: substrate holding means; etching liquid supply means; and a control device for controlling a plurality of electrodes. The control device performs an etching step of supplying a substrate with an etching liquid while rotating the substrate about a rotary axis line and an etching electrification step for electrifying the substrate in parallel with the etching step by applying a voltage to a plurality of electrodes so that absolute values of applied voltages are increased in an order of a first electrode and a second electrode.SELECTED DRAWING: Figure 7 |
