| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid-state imaging apparatus capable of improving a yield, while maintaining light-shielding performance by a light-shielding member, a method for manufacturing the solid-state imaging apparatus, and an imaging system.SOLUTION: The method for manufacturing the solid-state imaging apparatus according to one embodiment includes the steps of: forming a gate electrode of a first transistor and a gate electrode of a second transistor adjacent to the first transistor on a substrate; forming an insulator film covering the gate electrode of the first transistor and the gate electrode of the second transistor, so as to form a void between the gate electrode of the first transistor and the gate electrode of the second transistor; forming a film on the insulator film; and forming a light-shielding member by removing a part of the film by etching.SELECTED DRAWING: Figure 2 |
