| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To set the exposure light quantity by simple calculation in a method for forming a resist pattern and to produce a three-dimensional resist pattern having little error with respect to the designed value. <P>SOLUTION: The method for forming the resist pattern includes steps of: (S2) setting the amount of the resist to be removed in each region of a plurality of two-dimensional regions produced by dividing the objective three-dimensional resist pattern; (S3) calculating the exposure light quantity required to each region based on the amount of the resist to be removed in each region; (S4) determining the exposure light quantity to expose the resist surface in each region by using a spread function based on the required exposure light quantity in each region; and (S5, S6) exposing the photoresist based on the exposure light quantity of each region to form a three-dimensional resist pattern. Thus, the exposure light quantity can be set by easy calculation and the three-dimensional resist pattern having little error with respect to the designed value can be produced. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
