发明名称 感光性コポリマーおよびフォトレジスト組成物
摘要 A copolymer has the formula: wherein R 1 -R 5 are each independently H, C 1-6 alkyl, or C 4-6 aryl, R 6 is a fluorinated or non-fluorinated C 5-30 acid decomposable group; each Ar is independently a monocyclic, polycyclic, or fused polycyclic C 6-20 aryl group; each of R 7 and R 8 is independently -OR 11 or a - C(CF 3 ) 2 OR 11 group where each occurrence of R 11 is independently H, a fluorinated or non-fluorinated C 5-30 acid decomposable group, or a combination of these; each R 9 is independently F, a C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, or a C 1-10 fluoroalkoxy group; R 10 is a cation-bound C 10-40 photoacid generator-containing group, mole fractions a, b, and d are independently 0 to 0.80, mole fraction c is 0.01 to 0.80, e is 0 to 0.50 provided that where a, b, and d are 0, e is greater than 0, the sum of the mole fractions a+b+c+d+e is 1, 1 and m are independently integers of 1 to 4, and n is an integer of 0 to 5. A photoresist, and a coated substrate, each also include the copolymer.
申请公布号 JP5844613(B2) 申请公布日期 2016.01.20
申请号 JP20110244114 申请日期 2011.11.08
申请人 ローム アンド ハース エレクトロニック マテリアルズ エルエルシーRohm and Haas Electronic Materials LLC 发明人 ジェームズ・ダブリュー.サッカレー;イマッド・アカッド;スー・ジン・カン;オーウェンディ・オンゲイ
分类号 C08F212/06;G03F7/039;H01L21/027 主分类号 C08F212/06
代理机构 代理人
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