| 发明名称 |
STAND ALONE ANNEAL SYSTEM FOR SEMICONDUCTOR WAFERS |
| 摘要 |
A high throughput stand-alone anneal system has a horizontal row of docking stations at a front wall of an enclosure. A rack in the enclosure has a plurality of vertically stacked anneal modules. Robots within the enclosure move wafers from the docking stations to one of the anneal modules for rapid thermal anneal processing. |
| 申请公布号 |
US2016240405(A1) |
申请公布日期 |
2016.08.18 |
| 申请号 |
US201514620420 |
申请日期 |
2015.02.12 |
| 申请人 |
APPLIED Materials, Inc. |
发明人 |
Francischetti Vincent Steffan;Moore Robert B.;Silvetti Mario David;Shaviv Roey |
| 分类号 |
H01L21/67;H01L21/677;B25J11/00 |
主分类号 |
H01L21/67 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An anneal system comprising:
an enclosure; a horizontal row of two or more docking stations at a front wall of the enclosure; a buffer station in the enclosure; a rack in the enclosure having a plurality of vertically stacked anneal modules; and a system robot within the enclosure movable to carry a wafer from any of the docking stations to the buffer station; and a rack robot within the enclosure movable to carry a wafer from the buffer station to any of the anneal modules. |
| 地址 |
Santa Clara CA US |
