发明名称 METHODS OF FORMING SENSOR INTEGRATED PACKAGES AND STRUCTURES FORMED THEREBY
摘要 Methods of forming sensor integrated package devices and structures formed thereby are described. An embodiment includes providing a substrate core, wherein a first conductive trace structure and a second conductive trace structure are disposed on the substrate core, forming a cavity between the first conductive trace structure and the second conductive trace structure, and placing a magnet on a resist material disposed on a portion of each of the first and second conductive trace structures, wherein the resist material does not extend over the cavity.
申请公布号 US2016280535(A1) 申请公布日期 2016.09.29
申请号 US201514671549 申请日期 2015.03.27
申请人 Intel Corporation 发明人 Lee Kyu Oh;Zhou Zheng;Salama Islam A.;Eid Feras;Oster Sasha N.;Kong Lay Wai;Soto Gonzalez Javier
分类号 B81B3/00;B81C1/00 主分类号 B81B3/00
代理机构 代理人
主权项 1. A microelectronic sensor integrated package structure comprising: a package substrate comprising a dielectric material; a first conductive trace and a second conductive trace disposed directly on the dielectric material, wherein the first conductive trace is located in a first metal layer of the dielectric material and the second conductive trace is located in a second metal layer of the dielectric material; a resist material disposed directly on a portion of the first conductive trace; a magnet disposed directly on at least a portion of the resist material; and a cavity disposed between the magnet and the first trace, wherein the resist material does not extend across the cavity, and wherein the magnet is directly adjacent the cavity.
地址 Santa Clara CA US