| 摘要 |
PROBLEM TO BE SOLVED: To provide a template blank for nanoimprint lithography having a hard mask layer configuration capable of meeting the requirements of miniaturization, and to provide a manufacturing method therefor, and a method of manufacturing a template for nanoimprint lithography.SOLUTION: A template blank for nanoimprint lithography is configured to have at least a lower layer hard mask layer for etching a light-transmissive substrate, and an upper layer hard mask layer for etching the lower layer hard mask layer, on the principal surface of the light-transmissive substrate, and an atomic layer deposition film is employed as the upper layer hard mask layer. |
